Transfer chambers with an increased number of sides, semiconductor device manufacturing processing tools, and processing methods

ABSTRACT

A substrate processing system includes a factory interface, a transfer chamber, and a robot. The transfer chamber includes four first facets adapted for attachment to one or more first processing chambers and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets. The system includes a second processing chamber having a first interface attached to a first of the three second facets and a load lock attached to a second of the three second facets and to the factory interface. The system also includes a robot attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the one or more first processing chambers, the second processing chamber, and the load lock.

RELATED APPLICATION

This is a continuation application of, and claims priority from, U.S. patent application Ser. No. 15/029,502, filed Apr. 14, 2016, and entitled “TRANSFER CHAMBERS WITH AN INCREASED NUMBER OF SIDES, SEMICONDUCTOR DEVICE MANUFACTURING PROCESSING TOOLS, AND PROCESSING METHODS,” which is a national stage application filed under 35 U.S.C. § 371 of PCT Application No. PCT/US2014/063708, filed Nov. 3, 2014, and entitled “TRANSFER CHAMBERS WITH AN INCREASED NUMBER OF SIDES, SEMICONDUCTOR DEVICE MANUFACTURING PROCESSING TOOLS, AND PROCESSING METHODS,” which claims priority from U.S. Provisional Patent Application No. 61/899,862 filed Nov. 4, 2013, and entitled “SEMICONDUCTOR DEVICE MANUFACTURING PLATFORM WITH AN INCREASED NUMBER OF SIDES,” each of which is hereby incorporated by reference herein in its entirety for all purposes. This application is also a related sibling of U.S. patent application Ser. No. 16/359,561, entitled “TRANSFER CHAMBERS WITH AN INCREASED NUMBER OF SIDES, SEMICONDCUTOR DEVICE MANUFACTURING PROCESSING TOOLS, AND PROCESSING METHODS,” which is also incorporated by this reference.

FIELD

The present disclosure relates to semiconductor device manufacturing, and more specifically to semiconductor device manufacturing platform configurations.

BACKGROUND

Manufacturing of semiconductor devices involves performing a sequence of procedures with respect to a substrate or “wafer” such as a silicon substrate, a glass plate, and the like. These steps may include polishing, deposition, etching, photolithography, heat treatment, and so forth. Usually a number of different processing steps may be performed in a single processing system or “tool” that includes a plurality of processing chambers. However, it is generally the case that other processes are performed at other processing locations within a fabrication facility, and it is accordingly necessary that substrates be transported within the fabrication facility from one processing location to another. Depending on the type of semiconductor device to be manufactured, there may be a relatively large number of processing steps employed, to be performed at many different processing locations within the fabrication facility.

It is conventional to transport substrates from one processing location to another within substrate carriers such as sealed pods, cassettes, containers, and so forth. It is also conventional to employ automated substrate carrier transport devices, such as automatic guided vehicles, overhead transport systems, substrate carrier handling robots, and the like, to move substrate carriers from location to location within the fabrication facility or to transfer substrate carriers from or to a substrate carrier transport device.

Such transport of substrates typically involves exposing the substrates to room air, or at least to non-vacuum conditions. Either may expose the substrates to an undesirable environment (e.g., oxidizing species) and/or other contaminants.

SUMMARY

In one aspect, a substrate processing system includes a factory interface and a transfer chamber, which includes four first facets adapted for attachment to one or more first processing chambers and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets. The system further includes a second processing chamber having a first interface attached to a first of the three second facets. The system further includes a load lock attached to a second of the three second facets, the load lock also attached to the factory interface. The system further includes a robot attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the one or more first processing chambers, the second processing chamber, and the load lock.

In another aspect, a substrate processing system includes a transfer chamber having four first facets adapted for attachment to one or more first processing chambers and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets. The system further includes a single robot attached to a bottom of the transfer chamber and adapted to pass substrates through the four first facets and the three second facets. The system further includes an interface unit comprising an integral unit body that comprises: a mating piece having three interface sides to attach to the three second facets; a second processing chamber having a first of the three interface sides; a load lock having a second of the three interface sides; and a third processing chamber having a third of the three interface sides.

In another aspect, a mainframe for a semiconductor manufacturing device is provided. The mainframe includes a transfer chamber. The transfer chamber includes a bottom and four first facets attached to the bottom, wherein each of the first four facets is adapted for attachment to a first processing chamber. The transfer chamber includes two second facets attached to the bottom, wherein each of the two second facets has a width that is narrower than that of each of the four first facets and is adapted for attachment to a second processing chamber that is smaller than the first processing chamber. The transfer chamber further includes a single third facet attached to the bottom, wherein the single third facet is adapted for attachment to a load lock. The transfer chamber further includes a robot attached to the bottom, the robot adapted to transfer substrates to and from each first processing chamber, each second processing chamber, and the load lock.

Numerous other aspects are provided in accordance with these and other embodiments of the disclosure. Other features and aspects of embodiments of the present disclosure will become more fully apparent from the following detailed description, the appended claims, and the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The drawings, described below, are for illustrative purposes only and are not necessarily drawn to scale. The drawings are not intended to limit the scope of this disclosure in any way.

FIGS. 1A-1B illustrates top schematic views of an example processing tool provided in accordance with embodiments.

FIGS. 2A-2B illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber of FIGS. 1A-1B, in accordance with embodiments.

FIGS. 2C-2D illustrates an isometric view and top plan view, respectively, of a transfer chamber of FIGS. 1A-1B having a robot disposed therein, in accordance with embodiments.

FIGS. 3A-3B illustrates an isometric view and top plan view, respectively, of the transfer chamber of FIGS. 1A-1B having an interface unit coupled to the transfer chamber, in accordance with embodiments.

FIGS. 3C-3D illustrates top and bottom isometric views, respectively, of the interface unit of FIGS. 3A-3B, in accordance with embodiments.

FIGS. 4A-4B illustrates an isometric view and top plan view, respectively, of the transfer chamber of FIGS. 1A-1B having three load lock chambers directly coupled to a first set of sides of the transfer chamber, in accordance with embodiments.

FIGS. 5A-5B illustrates an isometric view and top plan view, respectively, of an alternative transfer chamber, in accordance with embodiments.

FIGS. 5C-5D illustrates an isometric view and top plan view, respectively, of the transfer chamber of FIGS. 5A-5B having an interface unit coupled to the transfer chamber, in accordance with embodiments.

FIGS. 5E-5F illustrates top and bottom isometric views, respectively, of the interface unit of FIGS. 5A-B, in accordance with embodiments.

FIG. 6A illustrates a top view of an example processing tool in which two transfer chambers may be coupled together to provide additional sides for processing chambers, in accordance with embodiments.

FIG. 6B illustrates a top view of an additional example processing tool in which two transfer chambers are coupled together to provide additional sides for processing chambers, in accordance with embodiments.

DETAILED DESCRIPTION

Reference will now be made in detail to the example embodiments of this disclosure, which are illustrated in the accompanying drawings. Features of the various embodiments described herein may be combined with each other, unless specifically noted otherwise.

In accordance with embodiments of the present disclosure, a semiconductor device manufacturing platform, such as a tool and/or mainframe (referred to herein as a “processing tool” or “tool”), is provided that includes a transfer chamber including an increased number of locations (e.g., facets) for attaching or otherwise coupling processing chambers and substrate transfer units (e.g., one or more load locks and possibly one or more pass-through units). For example, in some embodiments, at least seven, at least eight, or even nine or more attachment locations may be provided in a transfer chamber within a single tool. Providing additional attachment locations increases a number of processing steps that may be performed at a single tool, may increase throughput by allowing for chamber redundancy (e.g., allowing multiple versions of the same processing chambers to be used in parallel) and allows substrates to remain under vacuum conditions during a larger portion of a manufacturing process.

These and other embodiments are described below with reference to FIGS. 1A-6B.

FIGS. 1A-1B illustrate top schematic plan views of an example processing tool 100 provided in accordance with embodiments of the disclosure. With reference to FIG. 1A, the processing tool 100 includes a transfer chamber 102 having a plurality of sides (or facets) 104 a-104 i forming a transfer chamber 102 having a nonagon shape. Other shapes and/or numbers of sides may be employed (e.g., forming a closed polygon).

In the embodiment of FIGS. 1A-1B, a first set of sides 104 a, 104 b and 104 c are narrower than the remaining second set of sides 104 d-104 i. First set of sides 104 a, 104 b and 104 c are employed to couple the transfer chamber 102 to one or more substrate transfer units, such as load locks 108 (e.g., one, two, or three load locks, for example) that couple to a factory interface 106. The remaining second set of sides 104 d-104 di may couple to processing chambers 110 a-110 f. In some embodiments, the first set of sides 104 a, 104 b and 104 c may each have a width of approximately 450 mm to 550 mm, and/or the second set of sides 104 d-104 i may each have a width of approximately 650 mm to 950 mm. However, in some embodiments, the first set of sides 104 a, 104 b, 104 c and/or the second set of sides 104 d-104 i may range from about 450 mm to 950 mm and/or may be the same size. Other widths may be employed for first set of sides 104 a-104 c and/or second set of sides 104 d-104 i, as may different widths for different sides.

In the embodiment of FIG. 1A, similar processing chambers are coupled to the second set of sides 104 d-104 i of transfer chamber 102 (e.g., each processing chamber may occupy a similar footprint). However, in some embodiments, such as the embodiment of FIG. 1B, processing chambers 110 a, 110 c, 110 e and 110 f may be similar processing chambers, such as epitaxial deposition chambers, while processing chambers 110 b and 110 d may be a different type of processing chamber, such as etch chambers. The different type is indicated by the footprint occupied by processing chambers 110 a, 110 c, 110 e and 110 f being different than the footprint occupied by processing chambers 110 b and 110 d. Other configurations, number and/or types of processing chambers may be employed.

As shown in FIG. 1B, processing chambers 110 a-110 f may be coupled to transfer chamber 102 via chamber interfaces 112 a-112 f, respectively. Such chamber interfaces 112 a-112f may include, for example, pass throughs, slit or gate valves, or the like, not separately shown. In embodiments in which a large processing chamber is coupled to the transfer chamber 102, it may be desirable to provide a deeper chamber interface that allows the large processing chamber to be moved and spaced further from the transfer chamber 102. This may be done to accommodate a larger footprint, to provide better service access, and the like, for example. In the embodiment of FIG. 1B, chamber interfaces 112 b and 112 d are shown as having a greater depth than chamber interfaces 112 a, 112 c, 112 e and 112 f. For example, the chamber interfaces 112 b and 112 d may have a depth of about 260 mm to about 320 mm, and/or the chamber interfaces 112 a, 112 c, 112 e and 112 f may have a depth of about 160 mm to about 260 mm. Thus, different ones of the second sets of sides 104 a-10 f may have chamber interfaces 112 a-112f having different depths. Other depths of the chamber interfaces 112 a-112 f may be employed.

The factory interface 106 is configured to receive one or more substrate carriers 114 a-114 d for supplying substrates to the processing chambers 110 a-f. While four substrate carriers are shown in FIGS. 1A-1B, it will be understood that the factory interface 106 may receive and/or be configured to receive more or fewer substrate carriers. In the embodiment of FIGS. 1A-1B, the geometrical center of the factory interface 106 is offset laterally by a distance “O” from a geometrical center of the transfer chamber 102 in order to provide additional access to the transfer chamber 102. In other embodiments, however, other or no offset may be provided.

FIGS. 2A-2B illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber 102, in accordance with embodiments provided herein. With reference to FIGS. 2A-2B, transfer chamber 102 includes slit openings 202 a-202 b in a first side 104 b and openings 204 a-204 b through the other sides 102 a, 104 c of the first set of sides for interfacing with up to three substrate transfer units, such as load locks (single, batch or stacked load locks, for example, not separately shown). Slit openings 202 a-202 b may be sized to allow an end effector to pass from the transfer chamber 102 into a load lock positioned in front of the slit openings 202 a-202 b. As described further below, openings 204 a-204 b may be sized larger than the slit openings 202 a-202 b to allow a wrist or other portion of a robot to extend through the transfer chamber 102 for reaching upper and lower (e.g., stacked) load locks positioned further from the transfer chamber 102. Example dimensions for the slit openings 202 a-202 b are about 45 mm×400 mm to about 65 mm×600 mm. Example dimensions for the openings 204 a-204 b are about 280 mm×400 mm to about 430 mm×600 mm. Other dimensions may be used for any of the slit openings 202 a-202 b and/or openings 204 a-204 b.

As shown in FIG. 2A, second set of sides 104 d-104 i include second openings 206 a-206 f, respectively, which allow a robot to transfer substrates between the transfer chamber 102 and processing chambers (e.g., 110 a-110 f) that are coupled to the transfer chamber 102. In some embodiments, the second openings 206 a-206 f may be enlarged to allow a portion of a robot (e.g., a wrist or other portion) to extend through the transfer chamber 102 during such transfers. Example dimensions for the second openings 206 a-206 f are about 180 mm×400 mm to about 270 mm×600 mm. Other dimensions may be used for the second openings 206 a-206 f.

In some embodiments, to provide additional strength to the transfer chamber 102, an upper lid 208 of the transfer chamber 102 may be provided with extra material in regions between the second openings 206 a-206 f. For example, a rib 210 may be provided between each opening 206 a-f and/or material may be removed in regions 212 in front of each second opening 206 a-206 f. For example, each rib 210 may extend about 20-30 mm further into the transfer chamber region than regions 212. Other rib sizes and/or configurations may be employed.

FIGS. 2C-2D illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber 102 having a robot 214 disposed therein, in accordance with embodiments provided herein. As seen in FIG. 2C, in some embodiments, the second openings 206 a-206 f may be sized to accommodate a wrist 216 of robot 214 so that robot 214 may extend further through the set of second sides 104 d-104 i of the transfer chamber 102 during substrate transfer operations. As shown in FIG. 2D, transfer chamber 102 may include one or more pump openings 218 for additional vacuum pumps (e.g., a cryogenic pump or similar device). In some embodiments, the robot 214 may be a dual-arm and/or offset-axis robot. Other robots may be employed.

FIGS. 3A-3B illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber 102 including an interface unit 302 coupled to the transfer chamber 102, in accordance with embodiments provided herein. The interface unit 302 is configured to allow the transfer chamber 102 to interface with up to three load locks (e.g., single or batch load locks, stacked load locks, or the like). All or a portion of the up to three load locks may be formed by the interface unit 302 in some embodiments. Furthermore, in some embodiments, a degas or other processing chamber (not shown) may be positioned above (or within) the interface unit 302, such as above (or within) load lock chambers 304 a and/or 304 b. Rear openings 305a-305c allow transfer of substrates between factory interface 106 and interface unit 302. Interface unit 302 may be coupled to the first set of sides 104 a-104 c and to the factory interface 106 by any suitable means such as fasteners (e.g., bolts, screws, or the like).

FIGS. 3C-3D are top and bottom isometric views, respectively, of an example embodiment of the interface unit 302, in accordance with embodiments provided herein. A front region of the interface unit 302 includes front interface sides 306 a-306 c that may couple with first set of sides 104 a-104 c of transfer chamber 102 (FIG. 1A), respectively. In some embodiments, first front interface side 306 a may include first slit openings 308 a, 308 b, second front interface side 306 b may include second slit openings 310 a, 310 b and third front interface side 306 c may include third slit openings 312 a, 312 b for accommodating substrate transfers between the transfer chamber 102 and load locks (and/or degas/processing chambers) that are part of (or coupled to) the interface unit 302. As shown in FIG. 3D, load lock chambers 314 a-314 c provide up to three load locks (e.g., single load locks, batch load locks, stacked load locks, etc.) coupled to the transfer chamber 102.

FIGS. 4A-4B illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber 102 having three load locks 402 a, 402 b and 402 c directly coupled to the set of sides 104 a, 104 b, and 104 c, respectively, the transfer chamber 102, in accordance with embodiments provided herein. The load locks 402 a-402 c may be single or batch load locks and/or stacked load locks, and/or may include a degas or other processing chamber. Fewer than three load locks may be employed.

FIGS. 5A-5B illustrates an isometric view and top plan view, respectively, of an alternative embodiment of the transfer chamber 102, in accordance with embodiments provided herein. With reference to FIGS. 5A-5B, the narrower first set of sides 104 a, 104 b and 104 c (FIG. 1A) are replaced with a single side 504 that is relatively longer in width. Single side 504 may have a length Ls that may be longer than a length of any of the second set of sides 104 d-104 i. Such a design may simply the interface between the transfer chamber 102 and one or more load locks and/or degas/process chambers as described below with reference to FIGS. 5C-5F.

FIGS. 5C-5D illustrates an isometric view and top plan view, respectively, of an example embodiment of the transfer chamber 102 of FIGS. 5A-5B having an interface unit 506 coupled to the transfer chamber 102, in accordance with embodiments provided herein. The interface unit 506 allows the transfer chamber 102 to interface with up to three load locks (e.g., single or batch load locks, stacked load locks, or the like. All or a portion of the up to three load locks may be formed by the interface unit 506 in some embodiments. Further, in some embodiments, a degas or other processing chamber (not shown) may be positioned above or within the interface unit 506, such as above or within interface unit opening 508 a and/or interface unit opening 508 b. Rear interface openings 509 a-509 c allow transfer of substrates between factory interface 106 and interface unit 506.

FIGS. 5E-5F are top and bottom isometric views, respectively, of an example embodiment of the interface unit 506, in accordance with embodiments provided herein. A front region 510 of the interface unit 506 may couple with the single side 504 of transfer chamber 102 (FIG. 5A). In some embodiments, multiple interface sides (e.g., interface sides 512 a, 512 b and 512 c) are provided within the interface unit 506; and interface side 512 a may include slit openings 514 a, 514 b, interface side 512 b may include slit openings 516 a (FIG. 5F), 516 b, and interface side 512 c may include slit openings 518 a, 518 b for accommodating substrate transfers between the transfer chamber 102 and load locks (and/or degas/processing chambers) that are part of (or coupled to) the interface unit 506. As shown in FIGS. 5F, interface openings 520 a-520 c provide up to three load locks (e.g., single load locks, batch load locks, stacked load locks, etc.) coupled to the transfer chamber 102. However, other numbers of load locks may be provided, as well as other numbers of interface sides.

FIG. 6A illustrates a top view of an example processing tool 600 a in which first and second transfer chambers 102 a, 102 b may be coupled together to provide additional sides for coupling of processing chambers, in accordance with embodiments provided herein. With reference to FIG. 6A, the processing tool 600 a includes an interface unit 602 that couples the first transfer chamber 102 a to a factory interface 604. A substrate transfer device, such as a pass-through unit 606 couples the second transfer chamber 102 b to the first transfer chamber 102 a.

In the embodiment of FIG. 6A, the interface unit 602 allows up to three or more substrate transfer devices, such as up to three or more load locks 608 a-608 c (and/or degas/processing chambers) to supply substrates to the first transfer chamber 102 a. Pass-through unit 606 includes three pass-through locations 610 a-610 c, which may serve as hand-off locations for substrate transfers between the first and second transfer chambers 102 a, 102 b. In some embodiments, fewer pass-through locations may be employed. Furthermore, in some embodiments, pass-through locations 610 a-610 c may be capable of performing substrate processing such as degas, annealing, cooling, or the like. Other processes may take place at the pass-through locations 610 a-610 c.

The processing tool 600 a provides up to ten sides (facets) 612 a-612 j to which processing chambers may be coupled. In other embodiments, additional transfer chambers may be coupled with the addition of other pass-through units to provide any number of linked processing chambers.

In the embodiment of FIG. 6A, first transfer chamber 102 a includes first elongated side 614 a configured to couple to interface unit 602 and a second elongated side 614 b opposite the first elongated side 614 a configured to couple to pass-through unit 606. Second transfer chamber 102 b includes a single elongated side 614 c for coupling to pass-through unit 606. In some embodiments, second transfer chamber 102 b may include one or more additional elongated sides configured to couple to additional pass-through units (e.g., when one or more additional transfer chambers are to be employed). In the depicted embodiment, sides 612 a, 612 b, 612i, 612 j may be shorter in length than each of the first elongated side 614 a and the second elongated side 614 b. Likewise, in the depicted embodiment, the sides 612 c-612 g may be shorter in length than the single elongated side 614 c.

FIG. 6B illustrates a top view of another example of a processing tool 600 b that is similar to the processing tool 600 a of FIG. 6A, but which does not employ elongated sides along either of the first or second transfer chamber 102 a, 102 b, in accordance with embodiments provided herein. With reference to FIG. 6B, each of the first and second transfer chambers 102 a, 102 b is illustrated as being octagon shaped (eight-sided), for a total of sixteen sides 612 a-612 p, which may be of equal length. First transfer chamber 102 a is coupled to factory interface 604 via load locks 608 a, 608 b, and to second transfer chamber 102 b via one or more pass-through units 610 a, 610 b. Processing chambers 616 a-616j are shown coupled to sides 612 c, 612 d, 612 h, 612 g, 612 k, 612 l, 612 m, 612 n, 612 o, 612 p of the processing tool 600 b. In other embodiments, additional transfer chambers may be coupled with additional pass-through units to provide any number of linked processing chambers.

In each of FIG. 6A and 6B embodiments, the processing tool 600 a, 600 b includes one or more load locks (e.g., load locks 608 a-608 c), a pass-through unit (e.g., pass-through unit 606, 610 a, 610 b), a first transfer chamber (e.g., first transfer chamber 102 a) coupled between the one or more load locks (e.g., load locks 608 a-608 c) and the pass-through unit (e.g., pass-through unit 606, 610 a, 610 b), and a second transfer chamber (e.g., second transfer chamber 102 b) coupled to the pass-through unit (e.g., pass-through unit 606, 610 a, 610 b). A total number of sides in each process tool 600 a, 600 b that are configured to receive process chambers between the first transfer chamber 102 a and the second transfer chamber 102 b, in sum, is at least ten. Transfers within each of the first transfer chamber 102 a and the second transfer chamber 102 b are each serviceable by a single robot (e.g., robots 214 a, 214 b—shown as dotted circles).

In another aspect, a method of semiconductor device processing is provided. The method includes providing a transfer chamber (e.g., transfer chamber 102, 102 a) having least one first side (e.g., single side 504 or first set of sides 504 a-104 c) of a first width coupled to one or more substrate transfer units (e.g., one or more load locks or one or more pass-through units 606) and at least a second set of sides of a second width that is different than the first width, the second set of sides coupled to a plurality of processing chambers, wherein a total number of sides of the transfer chamber is at least seven, but may be eight, nine, or more. The method further includes transferring substrates between the one or more substrate transfer units (e.g., load locks or pass-through units 606) and at least one of the plurality of processing chambers (e.g., with a single robot (e.g., robot 214 in the transfer chamber.

While described primarily with reference to seven, eight or nine sides, it will be understood that the transfer chamber 102 may include any suitable number of sides, such as ten sides, eleven sides, twelve sides, or the like, or fewer than seven sides.

The foregoing description discloses only example embodiments of the disclosure. Modifications of the above-disclosed apparatus, systems and methods which fall within the scope of the disclosure will be readily apparent to those of ordinary skill in the art. Accordingly, while the present disclosure has been disclosed in connection with example embodiments, it should be understood that other embodiments may fall within the scope of the disclosure, as defined by the following claims. 

What is claimed is:
 1. A substrate processing system comprising: a factory interface; a transfer chamber comprising: four first facets adapted for attachment to one or more first processing chambers; and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets; a second processing chamber having a first interface attached to a first of the three second facets; a load lock attached to a second of the three second facets, the load lock also attached to the factory interface; and a robot attached to a bottom of the transfer chamber, the robot adapted to transfer substrates to and from the one or more first processing chambers, the second processing chamber, and the load lock.
 2. The substrate processing system of claim 1, further comprising a degas chamber having a second interface attached to a third of the three second facets.
 3. The substrate processing system of claim 2, wherein the second of the three second facets is positioned between the first and the second of the three second facets.
 4. The substrate processing system of claim 1, further comprising the one or more first processing chambers, wherein the one or more first processing chambers are epitaxial deposition chambers.
 5. The substrate processing system of claim 1, wherein the load lock is one of a single, a batch, or a stacked load lock.
 6. The substrate processing system of claim 1, wherein the factory interface is laterally offset from a geometrical center of the transfer chamber.
 7. The substrate processing system of claim 1, wherein the robot comprises two arms, each attached to a separate end effector.
 8. The substrate processing system of claim 1, wherein the second processing chamber is one of a pre-processing chamber or a post-processing chamber.
 9. A substrate processing system comprising: a transfer chamber comprising: four first facets adapted for attachment to one or more first processing chambers; and three second facets, wherein each of the three second facets has a width that is narrower than that of each of the four first facets; a single robot attached to a bottom of the transfer chamber and adapted to pass substrates through the four first facets and the three second facets; and an interface unit comprising an integral unit body that comprises: a mating piece having three interface sides to attach to the three second facets; a second processing chamber having a first of the three interface sides; a load lock having a second of the three interface sides; and a third processing chamber having a third of the three interface sides.
 10. The substrate processing system of claim 9, wherein the load lock is positioned in a middle of the interface unit between the second processing chamber and the third processing chamber.
 11. The substrate processing system of claim 9, further comprising the one or more first processing chambers, wherein the one or more first processing chambers are epitaxial deposition chambers, and the second processing chamber and the third processing chamber are smaller than each of the one or more first processing chambers.
 12. The substrate processing system of claim 9, wherein the load lock is one of a single, a batch, or a stacked load lock.
 13. The substrate processing system of claim 9, further comprising a factory interface attached to the load lock.
 14. The substrate processing system of claim 13, wherein the factory interface is laterally offset from a geometrical center of the transfer chamber.
 15. The substrate processing system of claim 9, wherein the robot comprises two arms, each attached to a separate end effector.
 16. The substrate processing system of claim 9, wherein the second processing chamber is a pre-processing chamber and the third processing chamber is a post-processing chamber.
 17. A mainframe for a semiconductor manufacturing device comprising: a transfer chamber comprising: a bottom; four first facets attached to the bottom, wherein each of the first four facets is adapted for attachment to a first processing chamber; two second facets attached to the bottom, wherein each of the two second facets has a width that is narrower than that of each of the four first facets and is adapted for attachment to a second processing chamber that is smaller than the first processing chamber; a single third facet attached to the bottom, wherein the single third facet is adapted for attachment to a load lock; and a robot attached to the bottom, the robot adapted to transfer substrates to and from each first processing chamber, each second processing chamber, and the load lock.
 18. The mainframe of claim 17, wherein the single third facet is positioned between the two second facets and also has a width that is narrower than that of each of the four first facets.
 19. The mainframe of claim 17, wherein the load lock is one of a single, a batch, or a stacked load lock.
 20. The mainframe of claim 17, wherein the robot comprises two arms, each attached to a separate end effector, and wherein the two second facets each comprise an opening through which to insert and withdraw one of the two arms of the robot.
 21. The mainframe of claim 17, wherein the single third facet comprises slit openings through which to insert the substrates to and from the load lock. 